Vanox™ System for Point-of-Use Ultrapure
Water Treatment Systems

Siemens introduces an effective method for removing total organic carbon (TOC) in point-of-use (POU) ultrapure water treatment systems for semiconductor applications.

Our proprietary advanced oxidation process – the Vanox™ POU system – can consistently reduce TOC to 0.5 parts per billion (ppb) and treat seasonal TOC variations in feed water. This is important because TOC elevations above 1.0 ppb can directly affect the manufacturing process, significantly impacting product yields.

The Vanox™ system removes and/or controls urea primarily associated with THMs (Trihalomethane), such as chloroform, which is generated as a by-product from the use of chlorine. The system also addresses urea and IPA, the primary organics that can require a more elaborate treatment and cause potential risk to a fabricator/manufacturing plant.

When our process is applied in a POU system, it provides improved yields and a better solution to target trace organics. The Vanox™ system provides a more effective destruction of IPA and other organic compounds that traditional ozone and peroxide/UV does not provide in re-use and reclaim facility waste streams.

The Vanox™ POU system also delivers critical control temperature, low trace metal contaminates and reduces particles to less than 100 units per litre at .05 microns. The current industry standard for POU particle reduction is 200-500 units per litre.

Because the typical water quality requirement for ultrapure water is 1.0ppb, our process allows for reliable and consistent TOC reduction and control. The Vanox™ POU system has made improvements in the reactor design, allowing reductions in power and capital costs, and reductions in chemical use.

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